Photoacid generation in polymeric films.

Abstract

A major photoproduct from the irradiation of triphenylsulfonium salts is a Bronsted acid. This photochemical process has been used in several polymer film applications where the acid is used for crosslinking of films or to initiate some other acid catalyzed reaction. Despite the widespread applications of these materials, little has been published about the efficiency of acid generation in polymeric films or catalytic chain length associated with chemically amplified systems. This talk will describe the use of a merocyanine dye technique to analyze for acid production in polymer films.The amount of acid produced on irradiation (LTV or E-beam) has been determined by this method and the catalytic chain length has Leen measured for one chemically amplified resist system.

Chemically amplified resists. III. The final phenolic product formation mechanism from t-BOC.

“…The acid catalyzed decomposition process of t-BOC to a phenolic compound was confirmed theoretically in this research to be the first order reaction with respect to each of the concentrations of protons and (SO3CF3)-anions, respectively, i. e. [4]. Their results are rearranged and shown in Fig.…”