Photocrosslinkable polymers with degradable properties

Shirai, Masamitsu

doi:10.1038/pj.2014.79

Cited by 35 publications

(37 citation statements)

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“…The final dimension of the glued gelatin films was 1.5 cm ¢ 5 cm. We used ultra violet radiation to treat them using the same conditions as previously described by different authors [21][22][23][24]. Using this…”

Section: Estimation Of Adhesive Capacity: Effect Of Substratementioning

confidence: 99%

RETRACTED: A Bio Polymeric Adhesive Produced by Photo Cross-Linkable Technique

2016

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Abstract:The advantages of photo polymerization methods compared to thermal techniques are: rapid cure reactions, low energy demands, solvent free requirements and room temperature use. In order to form a macromer, polycaprolactone (PCL) was cross-linked via ultraviolet power with 2-isocyanatoethyl methacrylate. Different methods of characterization were carried out: estimation of swelling capacity, adhesive capacity (using aminated substrates), surface energy (by contact angle), and attenuated total reflectance Fourier transform infrared. In addition to these experiments, we carried out dynamical mechanical thermal analysis, thermogravimetry and thermorphology characterizations of PCL. Thus, it has been concluded that the prepared macromer could be transformed into membranes that were effective as a medical adhesive. The degree of cross linking has been estimated using two different techniques: swelling of the samples and photo cross linking of the samples with different periods of irradiation at relatively high UV-power (600 mW/cm 2 ).

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Section: Estimation Of Adhesive Capacity: Effect Of Substratementioning

confidence: 99%

RETRACTED: A Bio Polymeric Adhesive Produced by Photo Cross-Linkable Technique

2016

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“…Although many types of blocked units have been developed, the baking temperature for the de‐blocking reactions depends strongly on the structure of the blocking units . Tetrahydropyranyl‐protected methacrylic acid was chosen for the resist component, because the acid‐catalyzed de‐protection reaction occurs around room temperature to generate the methacrylic acid unit, inducing the enhanced dissolution of the resist into an aqueous alkaline solution . Incorporation of hydroxyl groups into the base polymer is expected to improve the adhesion properties between the resist and SUS screen.…”

Section: Resist Design Concept For Screen Platementioning

confidence: 99%

UV-curable positive photoresists for screen printing plate

Shirai

Okamura

2016

Polym. Int.

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One of the most interesting application areas of screen printing is the production of microelectronic devices. Although negative photoresists are commonly used for the screen printing plate, their resolution limit is about 30 m. A higher resolution of resist patterns on the screen plate is essential for microelectronic device applications. This paper describes the novel design of a UV-curable positive photoresist and its application to the screen printing plate. Positive patterns on the screen plate were obtained by conventional photolithography using a photomask and 365 nm light and the patterns were exposed to 254 nm light to enhance the mechanical strength of the resist patterns. It was essential to use photoacid generators sensitive to 365 nm and photoradical generators sensitive to 254 nm. A screen printing plate, which enabled the formation of 6 m wide conductive lines, was developed.

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“…[17] Other known examples are photocrosslinkable polymers. [18] However, such materials are difficult to be used as stimuli-responsive ones, where changes should be totally reversible. Thus, there is an urgent need to develop a strategy to actuate polymers with light for high-amplitude actuating soft matter systems: coatings, hybrids.…”

Section: Introductionmentioning

confidence: 99%