Photon and ion beam assisted deposition of titanium nitride

Wengenmair, H.; Gerlach, Jürgen W.; Preckwinkel, U.; Stritzker, B.; Rauschenbach, B.

doi:10.1016/0169-4332(96)00102-x

Cited by 20 publications

(4 citation statements)

References 9 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…12,13 It has also been shown that UV irradiation during deposition can improve the crystallinity of films grown under vacuum, without any oxygen. 14,15 Moreover, the UV lamp was also used during cooling down from the deposition temperature to room temperature under 300 Torr of oxygen since UV-assisted oxygen anneals have also been shown to improve the properties of PLD grown films. 16,17 The chemical composition and bonding were investigated by x-ray photoelectron spectroscopy ͑XPS, Perkin Elmer 5100͒ using Mg K␣ radiation ͑1253.6 eV͒ and takeoff angles of 45°and 20°.…”

mentioning

confidence: 99%

Characteristics of the surface layer of barium strontium titanate thin films deposited by laser ablation

Crăciun

Singh

2000

Applied Physics Letters

180

View full text Add to dashboard Cite

Ba 0.5 Sr 0.5 TiO 3 ͑BST͒ thin films grown on Si by an in situ ultraviolet-assisted pulsed laser deposition ͑UVPLD͒ technique exhibited significantly higher dielectric constant and refractive index values and lower leakage current densities than films grown by conventional PLD under similar conditions. X-ray photoelectron spectroscopy ͑XPS͒ investigations have shown that the surface layer of the grown films contained, besides the usual BST perovskite phase, an additional phase with Ba atoms in a different chemical state. PLD grown films always exhibited larger amounts of this phase, which was homogeneously mixed with the BST phase up to several nm depth, while UVPLD grown films exhibited a much thinner ͑ϳ1 nm͒ and continuous layer. The relative fraction of this phase was not correlated with the amount of C atoms present on the surface. Fourier transform infrared spectroscopy did not find any BaCO 3 contamination layer, which was believed to be related to this new phase. X-ray diffraction measurement showed that although PLD grown films contained less oxygen atoms, the lattice parameter was closer to the bulk value than that of UVPLD grown films. After 4 keV Ar ion sputtering for 6 min, XPS analysis revealed a small suboxide Ba peak for the PLD grown films. This finding indicates that the average Ba-O bonds are weaker in these films, likely due to the presence of oxygen vacancies. It is suggested here that this new Ba phase corresponds to a relaxed BST surface layer.

show abstract

mentioning

confidence: 99%

Characteristics of the surface layer of barium strontium titanate thin films deposited by laser ablation

Crăciun

Singh

2000

Applied Physics Letters

180

View full text Add to dashboard Cite

show abstract

“…Also, because In and Sn can react with oxygen during PLD even in gas phase [5], it is very likely they will react even more with ozone. Also, the surface mobility of adatoms is increased by UV irradiation [20]. It was found that under identical conditions the PLD grown samples were a little bit thicker than UVPLD grown ones, implying that the desorption of loosely bound adatoms was also increased during UV irradiation.…”

Section: Resultsmentioning

confidence: 96%

Room Temperature Growth of Indium Tin Oxide Films By Ultraviolet-Assisted Pulsed Laser Deposition

et al. 2000

View full text Add to dashboard Cite

The characteristics of indium tin oxide (ITO) films grown at room temperature on (100) Si and Coming glass substrates by an in situ ultraviolet-assisted pulsed laser deposition (UVPLD) technique have been investigated. The most important parameter, which influenced the optical and electrical properties of the grown films, was the oxygen pressure. For oxygen pressure below 1 mtorr, films were metallic, with very low optical transmittance and rather high resistivity values. The resistivity value decreased when using higher oxygen pressures while the optical transmittance increased. The optimum oxygen pressure was found to be around 10 mtorr. For higher oxygen pressures, the optical transmittance was better but a rapid degradation of the electrical conductivity was noticed. X-ray photoelectron spectroscopy investigations showed that ITO films grown at 10 mtorr oxygen are fully oxidized. All of the grown films were amorphous regardless of the oxygen pressure used.

show abstract

“…The magnetic field does not directly influence the ion motion, but the ion flux follows the electrons due to electrostatic attraction influencing the microstructure of the film [3][4][5][6]. Alternatively, ion bombardment can also affect the film growth through resputtering and amorphization [7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

Effects of substrate positioning for TiAlN films deposited by an inverted cylindrical magnetron sputtering system

Abu-Safe

Abushgair

Gordon

2009

Surface and Coatings Technology

View full text Add to dashboard Cite

Photon and ion beam assisted deposition of titanium nitride

Cited by 20 publications

References 9 publications

Characteristics of the surface layer of barium strontium titanate thin films deposited by laser ablation

Characteristics of the surface layer of barium strontium titanate thin films deposited by laser ablation

Room Temperature Growth of Indium Tin Oxide Films By Ultraviolet-Assisted Pulsed Laser Deposition

Effects of substrate positioning for TiAlN films deposited by an inverted cylindrical magnetron sputtering system

Contact Info

Product

Resources

About