2010
DOI: 10.1021/nl101609s
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Photopatternable Quantum Dots Forming Quasi-Ordered Arrays

Abstract: We have functionalized core-shell CdSe/ZnS quantum dots (QDs) with a photosensitive monolayer, rendering them solution processable and photopatternable. Upon exposure to ultraviolet radiation, films composed of this material were found to polymerize, forming interconnected arrays of QDs. The photoluminescence properties of the nanocrystal films increased with photocuring. The material was found to be suitable for spin casting and was used as the active layer in a green electroluminescent device. The electrolum… Show more

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Cited by 60 publications
(34 citation statements)
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“…Copyright 2008, American Chemical Society. (c,f) Reproduced with permission . Copyright 2010, American Chemical Society.…”
Section: Hybrids Of Colloidal Inorganic Nanoparticles and π‐Conjugatementioning
confidence: 99%
“…Copyright 2008, American Chemical Society. (c,f) Reproduced with permission . Copyright 2010, American Chemical Society.…”
Section: Hybrids Of Colloidal Inorganic Nanoparticles and π‐Conjugatementioning
confidence: 99%
“…Owing to their specific wavelength emission feature, QDs are useful for applications in particle encoding, imaging, sensing, LASER, and solar cells [103]- [106]. Park et al presented photopatternable QDs that were composed of a CdSe/ZnS core and surrounding photosensitive monolayer [107]. They uniformly dispersed these QDs into photopolymerizable resin, and fabricated 2-D patterns and 3-D structures with it by TPP.…”
Section: Optical Application Of Nanocomposites Using Absorption Prmentioning
confidence: 99%
“…The photopatternable QDs used for our work were synthesized following a reported procedure. 34,35 The structure of the photopatternable QD is shown in Figure 4. The ligand consisted of a thiol group for interacting with the CdSe-ZnS core shell quantum dots, there were two-patternable bonds in the ligand an inner siloxane layer capable of thermal cleavage and crosslinking and a methacrylate terminal capable of photocrosslinking.…”
Section: Quantum Dot Embedded Microstructuresmentioning
confidence: 99%
“…dibromo-3,6-bis(3,7-dimethyloctyloxy)-9,90-spirobifluoren (TP-MOSF-TP)[1mg] was added as a two-photon photosensitizer to all resin employed in two-photon lithography.Photopatternable quantum dots and TPA dye were synthesized following reported methods and obtained from nanophotonic materials lab, Hannam university 7,8. …”
mentioning
confidence: 99%