IEEE Symposium on Ultrasonics
DOI: 10.1109/ultsym.1990.171331
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Piezoelectric devices for frequency control and selection in Japan

Abstract: A b s t r a c t P i e z o e l e c t r i c materials f o r SAW d e v i c e s w i l l be reviewed. A l l m a t e r i a l s have some d i s t r i b u t i o n o f m a t e r i a l c o n s t a n t s . The t y p i c a l r e s u l t s o f t h e d i s t r i b u t i o n of LSAW v e l o c i t y i n a s u b s t r a t e as measured by t h e Line-Focus-Beam u l t r a s o n i c microscope w i l l be r e p o r t e d . The d e s i g n s of o s c i l l a t o r c i r c u i t s u s i n g bulk wave and s u r f a c e a c o u s t i … Show more

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Cited by 8 publications
(5 citation statements)
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“…40) and ( 4.41) and the object function of ( 4.42) as their input data. 40) and ( 4.41) and the object function of ( 4.42) as their input data.…”
Section: Linear Programmingmentioning
confidence: 99%
See 2 more Smart Citations
“…40) and ( 4.41) and the object function of ( 4.42) as their input data. 40) and ( 4.41) and the object function of ( 4.42) as their input data.…”
Section: Linear Programmingmentioning
confidence: 99%
“…ZnO has already been used for the development of TV-IF filters [39,40] and front-end filters in the 1.5 GHz range for mobile communications (41]. ZnO has already been used for the development of TV-IF filters [39,40] and front-end filters in the 1.5 GHz range for mobile communications (41].…”
Section: Thin Filmsmentioning
confidence: 99%
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“…Piezoelectric zinc oxide (ZnO) thin films are used as surface acoustic wave (SAW) devices in the VHF and UHF bands [1] and as ultrasonic transducers [2]. They have also been studied in applications to thin-film bulk resonators [3] and sensors [4].…”
Section: Introductionmentioning
confidence: 99%
“…These high-quality characteristics are not obtained by ordinary RF magnetron sputtering, but are believed to be based on the following characteristics of ECR sputtering. (1) The sputter particles can migrate over a wide range after reaching the substrate because the gas pressure during sputtering is a conspicuously low 10 4 Torr and the sputter particles incident on the substrate have a large motion energy. (2) There is little irradiation of high-energy particles to the thin film because the high-density plasma generated by microwave irradiation is highly concentrated.…”
Section: Introductionmentioning
confidence: 99%