2014
DOI: 10.1007/s10948-014-2537-9
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Planar Structure Optimization of Extraordinary Magnetoresistance in Semiconductor–Metal Hybrids

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Cited by 7 publications
(9 citation statements)
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“…The asymmetric circular geometry (figure 2(b)) was based on our previous work [41] using α = 12/16 with a 90% offset in the metallic inclusion. The dimensions used in the bar-shape device (figure 2(c)) were also based on previous work [35,38] where it was shown that a length of 45 µm, a semiconductor width of 3 µm, a metal width of 15 µm and a voltage probe distance of 8 µm results in a maximal magnetoresistance at all magnetic fields. The multi-branched structure (figure 2(d)) was adapted from the work by Huang et al describing a Hall bar-like metal inclusion combined with ellipsoidal edges [38].…”
Section: Methodsmentioning
confidence: 99%
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“…The asymmetric circular geometry (figure 2(b)) was based on our previous work [41] using α = 12/16 with a 90% offset in the metallic inclusion. The dimensions used in the bar-shape device (figure 2(c)) were also based on previous work [35,38] where it was shown that a length of 45 µm, a semiconductor width of 3 µm, a metal width of 15 µm and a voltage probe distance of 8 µm results in a maximal magnetoresistance at all magnetic fields. The multi-branched structure (figure 2(d)) was adapted from the work by Huang et al describing a Hall bar-like metal inclusion combined with ellipsoidal edges [38].…”
Section: Methodsmentioning
confidence: 99%
“…The dimensions used in the bar-shape device (figure 2(c)) were also based on previous work [35,38] where it was shown that a length of 45 µm, a semiconductor width of 3 µm, a metal width of 15 µm and a voltage probe distance of 8 µm results in a maximal magnetoresistance at all magnetic fields. The multi-branched structure (figure 2(d)) was adapted from the work by Huang et al describing a Hall bar-like metal inclusion combined with ellipsoidal edges [38]. The edges drastically reduce the zero-field resistance as the current trajectory is primarily going through the highly conducting metallic inclusion, yielding the highest simulated magnetoresistance of 10 10 % at 5 T reported to date.…”
Section: Methodsmentioning
confidence: 99%
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