Plasma charging defect inspection and monitors in poly-buffered STI

Yu, C.H.; Liou, Y.H.; Tu, Y. L.; Wu, C.S.; Chen, Y.S.; Pai, C.Y.; Tasi, Chi-Tsung; Chi, Min-Hwa

doi:10.1109/issm.2001.962936

2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)

DOI: 10.1109/issm.2001.962936

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Plasma charging defect inspection and monitors in poly-buffered STI

C.H. Yu

Y.H. Liou²,

Y. L. Tu³

et al.

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Control of arcing problem in the passivation HDP deposition process solution

Lin

Huang

et al.

Semiconductor Manufacturing Technology Workshop, 2002

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Arcing defect was found afier passivation HDP film deposition. According to arcing defect cross-section analysis, passivation arcing occurrence shows a strong correlation with the metal exposed on the wafer. Metal exposed likes an electrode which will attract plasma to discharge on this positon and caused arcing problem. Therefore, there are two approachs to suppress passivation arcing occurrence. One is to avoid metal exposed as an electrode and the other is to avoid unstable plasma discharged on wafer. New nn-bias liner oxide recipe was implemented to solve passivation arcing problem. It's proposed to increase un-bias liner oxide thickness under zero bias setting and to add additional buffer step for bias power ramp up step after un-bias liner oxide deposition. The thicker un-bias liner oxide thickness can be isolated itom exposed metal to contact with HDP high energy plasma directly, so the plasma will not be discharged on the position. And add additional buffer step for bias power ramp up step can avoid bias power overshot. This can prevent unstable plasma discharged on the wafer. According to our experiment and tracing results, new un-bias liner recipe is very effective to suppress passivation arcing occurrence and without other side effect.

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Control of arcing problem in the passivation HDP deposition process solution

Lin

Huang

et al.

Semiconductor Manufacturing Technology Workshop, 2002

View full text Add to dashboard Cite

show abstract

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Plasma charging defect inspection and monitors in poly-buffered STI

Cited by 1 publication

References 6 publications

Control of arcing problem in the passivation HDP deposition process solution

Control of arcing problem in the passivation HDP deposition process solution

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