Platinum Thin‐Film Electrodes Prepared by a Cost‐Effective Chemical Vapor Deposition Technique

Abstract

Thin-film growth of metallic platinum by aerosol-assisted chemical vapor deposition (AA-CVD) is an attractive alternative to the application of vacuum-based methods. This versatile and scalable technique allows gas phase deposition of thin-films from nebulized precursor solutions in a simple, open setup at moderate temperatures between 400 and 600 C. We discuss the film growth mechanisms on silicon and zirconia substrates in terms of microstructure, surface coverage, sheet resistance, and thermal stability. Furthermore, the positive influence of Pt thin-films deposited by AA-CVD on the area specific resistance (ASR) of symmetric Pt/YSZ/Pt cells in air is presented.[*] Dr.

Electrochemical CO2 Reduction to Fuels Using Pt/CNT Catalysts Synthesized in Supercritical Medium

“…7,22,33 This result has been attributed to the effect of nanoconfinement and the local increase of CO 2 and intermediates concentration promoted by the use of nanostructures. 22,34,35 Regarding metal deposition, it has been carried out successfully using different techniques, such as chemical vapor deposition (CVD), 36 impregnation, 37 deposition−precipitation, 38 or a sonochemical approach, 39 among others. Generally, conventional methods of synthesis of these catalysts involve the use of large amounts of organic solvents, which is a major drawback from an environmental point of view, due to the large amount of wastes generated.…”