2013
DOI: 10.1049/joe.2013.0033
|View full text |Cite
|
Sign up to set email alerts
|

Polarisation analysing complementary metal‐oxide semiconductor image sensor in 65‐nm standard CMOS technology

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
6
0

Year Published

2013
2013
2014
2014

Publication Types

Select...
4
2

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(6 citation statements)
references
References 11 publications
0
6
0
Order By: Relevance
“…The effect of the guard ring voltage has been presented in ref. 13. In this work, we apply 3.3 V to obtain maximum electron collection effect.…”
Section: Design and Specifications Of The Sensormentioning
confidence: 99%
See 3 more Smart Citations
“…The effect of the guard ring voltage has been presented in ref. 13. In this work, we apply 3.3 V to obtain maximum electron collection effect.…”
Section: Design and Specifications Of The Sensormentioning
confidence: 99%
“…Introducing the pixel into an array, a crosstalk between neighboring pixels should be considered. In order to characterize the inter-pixel crosstalk, we performed a single-pixel illumination and measured the signal around the illuminated pixel 13) . The light intensity observed in the adjacent un-illuminated pixel is understood as an artifact caused by the inter-pixel crosstalk.…”
Section: Arraymentioning
confidence: 99%
See 2 more Smart Citations
“…High polarization selectivity is desirable for neural recording. Hence, designing polarization filters out of the metal layers in a CMOS process is not desirable since it will lead to low extinction ratios [8]. The output and the reset voltage bus are shared together to minimize the numbers of buses in the pixel.…”
Section: Sensor Architecturementioning
confidence: 99%