Polymer Layers by Initiated CVD for Thin Film Gas Barrier Encapsulation

Spee, D.A.; Rath, J.K.; Schropp, Rei Ruud

doi:10.1002/9781118729175.ch9

Cited by 2 publications

(1 citation statement)

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“…This is achieved by using low wire temperatures during iCVD deposition [24]. Moreover, sensitivity to hydrogen radicals is dependent on the molecular structure of the used monomer and the amount of cross-linking in the deposited polymer [25]. Together with the stiffness of the polymer backbone, these features also determine the glass transition temperature of the polymer [26], which should be as high as possible, to avoid deformation of the material during inorganic layer deposition.…”

Section: Compatibility Of Hwcvd and Icvd Deposited Materialsmentioning

confidence: 99%

Using hot wire and initiated chemical vapor deposition for gas barrier thin film encapsulation

2015

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Section: Compatibility Of Hwcvd and Icvd Deposited Materialsmentioning

confidence: 99%

Using hot wire and initiated chemical vapor deposition for gas barrier thin film encapsulation

2015

Self Cite

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Polymer Thin Films and Surface Modification by Chemical Vapor Deposition: Recent Progress

Chen

Kim

Kováčik

et al. 2016

Annu. Rev. Chem. Biomol. Eng.

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Chemical vapor deposition (CVD) polymerization uses vapor phase monomeric reactants to synthesize organic thin films directly on substrates. These thin films are desirable as conformal surface engineering materials and functional layers. The facile tunability of the films and their surface properties allow successful integration of CVD thin films into prototypes for applications in surface modification, device fabrication, and protective films. CVD polymers also bridge microfabrication technology with chemical and biological systems. Robust coatings can be achieved via CVD methods as antifouling, anti-icing, and antihydrate surfaces, as well as stimuli-responsive or biocompatible polymers and novel nanostructures. Use of low-energy input, modest vacuum, and room-temperature substrates renders CVD polymerization compatible with thermally sensitive substrates and devices. Compared with solution-based methods, CVD is particularly useful for insoluble materials, such as electrically conductive polymers and controllably crosslinked networks, and has the potential to reduce environmental, health, and safety impacts associated with solvents. This review discusses the relevant background and selected applications of recent advances by two methods that display and use the high retention of the organic functional groups from their respective monomers, initiated CVD (iCVD) and oxidative CVD (oCVD) polymerization.

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Polymer Layers by Initiated CVD for Thin Film Gas Barrier Encapsulation

Cited by 2 publications

References 70 publications

Using hot wire and initiated chemical vapor deposition for gas barrier thin film encapsulation

Using hot wire and initiated chemical vapor deposition for gas barrier thin film encapsulation

Polymer Thin Films and Surface Modification by Chemical Vapor Deposition: Recent Progress

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