Quantitative analysis of surface amine groups on plasma-polymerized ethylenediamine films using UV–visible spectroscopy compared to chemical derivatization with FT-IR spectroscopy, XPS and TOF-SIMS

Kim, JinMo; Jung, Donggeun; Park, Yongsup; Kim, Yong-Ki; Moon, Dae Won; Lee, Tae Geol

doi:10.1016/j.apsusc.2006.09.011

Cited by 84 publications

(48 citation statements)

References 49 publications

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“…However, the concentration of middle-sized fragments in the active volume of the discharge during plasma deposition of AMA (C 3 H 5 þ and C 4 H 5 O þ ) and PiB (C 3 H 7 þ and C 4 H 7 O þ ) both tended to decrease. In literature, the chemical analysis of thin plasma films based on FTIR, XPS, [15,16] solid state 13 C NMR, [17] optical emission spectroscopy (OES), [18] electron spin resonance spectroscopy (ESR), [19,20] mass spectrometry, [21] and secondary ion mass spectroscopy (SIMS) [22][23][24] is predominant.…”

Section: Introductionmentioning

confidence: 99%

Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

Scheltjens

Ponte

Paulussen

et al. 2015

Plasma Process. Polym.

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Allyl methacrylate (AMA), methyl methacrylate (MMA), and propyl isobutyrate (PiB) are plasma deposited at ambient temperature in an atmospheric DBD reactor to assess the effect of precursor carbon double bond unsaturations. The specific plasma deposition rate (k 0 ) as a function of the Yasuda factor (Y f ) is quantified empirically by:Fourier transform infrared analysis indicates a loss of carbonyl functionalities with increasing plasma power, and Raman microscopy shows C5 5C double bonds in all plasma films. The methacrylate-like plasma films are found to be heterogeneous with a volatile and a cross-linked fraction observed by thermogravimetric analysis. Differential scanning calorimetry reveals a low glass transition temperature and a characteristic residual reactivity of the coatings.

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Section: Introductionmentioning

confidence: 99%

Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

Scheltjens

Ponte

Paulussen

et al. 2015

Plasma Process. Polym.

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“…It was found that nitrogen is present in mostly pyrrolic (B400.1 eV) 9,11 and pyridinic (B399 eV) 9,16,38,39 configurations with small amounts of quaternary nitrogen (401 eV) 9,11,16,40 and some amine groups (397.9 eV). 41,42 That the majority of the nitrogen is present in pyridinic or pyrrolic form suggests that the NH 3 -H 2 plasma treatment introduces nitrogen functional groups along the edges of the graphitic lattice of the PyC. It has been argued that for many electrochemical applications of N-doped carbon materials, nitrogen incorporated into edge sites of the graphitic lattice show the highest electrochemical activity.…”

Section: Physical Characterisationmentioning

confidence: 99%

Nitrogen-doped pyrolytic carbon films as highly electrochemically active electrodes

Nolan

McEvoy

Keeley

et al. 2013

Phys. Chem. Chem. Phys.

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abNitrogen-doped Pyrolytic Carbon (N-PyC) films were employed as an electrode material in electrochemical applications. PyC was grown by via non-catalysed chemical vapour deposition and subsequently functionalised via exposure to ammonia-hydrogen plasma. The electrochemical properties of the N-PyC films were investigated using the ferri/ferro-cyanide and hexaamine ruthenium(III) chloride redox probes.Exceptional electron transfer properties were observed and quantified for the N-PyC compared to the as-grown films. X-ray photoelectron spectroscopy confirmed the presence of nitrogen in edge plane graphitic configurations and the surface of the N-PyC was investigated using scanning electron microscopy and atomic force microscopy. The excellent electrochemical performance of the N-PyC, in addition to its ease of preparation, renders this material ideal for applications in electrochemical sensing.

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“…It is considered that surface roughness did not have significant effects on cell culture. Previously, we determined that amine density on the PPEDA film surface was decreased from 5.4 amine groups/nm 2 to 2.7 amine groups/nm 2 as ICP power was increased from 3 W to 70 W. 10,11 In addition to the results of Refs. 10 and 11, we could also correlate the surface amine density with water contact angle.…”

Section: Resultsmentioning

confidence: 98%

Culturing of Rat Intestinal Epithelial Cells-18 on Plasma Polymerized Ethylenediamine Films Deposited by Plasma Enhanced Chemical Vapor Deposition

Choi¹,

Kim²,

Kim³

et al. 2009

Bulletin of the Korean Chemical Society

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Many researchers studied cell culturing on surfaces with chemical functional groups. Previously, we reported surface properties of plasma polymerized ethylenediamine (PPEDA) films deposited by plasma enhanced chemical vapor deposition with various plasma conditions. Surface properties of PPEDA films can be controlled by plasma power during deposition. In this work, to analyze correlation of cell adherence/proliferation with surface property, we cultured rat intestinal epithelial cells-18 on the PPEDA films deposited with various plasma powers. It was shown that as plasma power was decreased, density of cells cultured on the PPEDA film surface was increased. Our findings indicate that plasma power changed the amine density of the PPEDA film surface, resulting in density change of cells cultured on the PPEDA film surface.

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Quantitative analysis of surface amine groups on plasma-polymerized ethylenediamine films using UV–visible spectroscopy compared to chemical derivatization with FT-IR spectroscopy, XPS and TOF-SIMS

Cited by 84 publications

References 49 publications

Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

Nitrogen-doped pyrolytic carbon films as highly electrochemically active electrodes

Culturing of Rat Intestinal Epithelial Cells-18 on Plasma Polymerized Ethylenediamine Films Deposited by Plasma Enhanced Chemical Vapor Deposition

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