Photomask Technology 2024 2024
DOI: 10.1117/12.3034592
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Rapid freeze-cleaning method

Satoshi Nakamura,
Masaya Kamiya,
Kensuke Demura
et al.

Abstract: Freeze cleaning involves the selective separation of particles from the substrate surface by utilizing the volume expansion that occurs when water in a supercooling state changes to ice. This allows particles to be efficiently and easily removed without causing pattern collapse. However, this method has a long processing time because of the following two factors: (i) the particles tend to remain at the four corners of a rectangular substrate; (ii) particle removal efficiency (PRE) per freeze-thaw cycle is low.… Show more

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