1954
DOI: 10.1021/jo01376a008
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Reactions With Esters, Halides, and Halogenoids. I. Bis-(Triethyltin) Oxide and Sulfide

Abstract: In Group IV-regular there is a gradual increase in basicity from the nearly neutral carbon to the clearly basic tin; this order of increasing basicity depends on experimental results mainly in aqueous or non-aqueous solutions.An exploratory publication on organogermanium esters established (Et3Ge)20 as the most basic, (Et2GeO)4 as the next most basic and [(EtGeO)20]n as the least basic ethylgermanium oxide (1). This work suggested that bis-(trialkyltin) oxides would react with numerous acids weaker than acetic… Show more

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Cited by 24 publications
(8 citation statements)
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“…Both tin-oxygen and tin-carbon bonds in bis(triorganotin) oxide were found to be prone to attack by TeCl 4 and PhTeCl 3 . Cleavage of tincarbon bond from R n SnR 4−n compounds employing TeCl 4 and PhTeCl 3 is well established and has been used as a convenient method for the preparation of organotellurium compounds in high yield and high purity [8,9].…”
Section: Action Of Tellurium Tetrachloride and Organotellurium Trichlmentioning
confidence: 99%
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“…Both tin-oxygen and tin-carbon bonds in bis(triorganotin) oxide were found to be prone to attack by TeCl 4 and PhTeCl 3 . Cleavage of tincarbon bond from R n SnR 4−n compounds employing TeCl 4 and PhTeCl 3 is well established and has been used as a convenient method for the preparation of organotellurium compounds in high yield and high purity [8,9].…”
Section: Action Of Tellurium Tetrachloride and Organotellurium Trichlmentioning
confidence: 99%
“…In sharp contrast to well-documented reactions of metallic and organometallic halides with tetraorganotins and hexaorganoditins, those involving R 3 Sn O SnR 3 compounds have been studied to a limited extent [1,2]. Action of silicon, tin, and phosphorus-halides on organotin oxides has been reported to produce organotin halides [3] whereas reaction of vinylmagnesium chloride with (Bu 3 Sn) 2 O yielded tributylvinyltin [4].…”
Section: Introductionmentioning
confidence: 99%
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