Reactive remote plasma sputtering of TiOx thin films and controlled growth of textured single-phase rutile using rf substrate biasing

Lawton, J.D.; Thornley, S.A.; Wakeham, S.J.; Thwaites, M.J.; Stolojan, V.; Baker, M.A.

doi:10.1016/j.surfcoat.2023.130247

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Reactive remote plasma sputtering of TiOx thin films and controlled growth of textured single-phase rutile using rf substrate biasing

Cited by 3 publications

References 52 publications

Low-temperature stabilization of rutile in W-doped Titania thin films deposited by magnetron Co-Sputtering

Low-temperature stabilization of rutile in W-doped Titania thin films deposited by magnetron Co-Sputtering

Black titanium oxide: synthesis, modification, characterization, physiochemical properties, and emerging applications for energy conversion and storage, and environmental sustainability

Low-Temperature Stabilization of Rutile in W-Doped Titania Thin Films Deposited by Magnetron Co-Sputtering

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