1992
DOI: 10.1021/cr00012a002
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Recent advances in the selective formation of the carbon-fluorine bond

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Cited by 366 publications
(126 citation statements)
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“…(3)). [15], wobei der letzte Wert sehr zweifelhaft erscheint, da er die Summe der I±F-Kovalenzradien von 1,97 A Ê [16] um 21% unterschreitet. Interessant ist der Gang der Absta È nde I-ipso-C in der Reihe der C 6 F 5 IF n -Verbindungen mit n = 0, 2 und 4.…”
Section: Ergebnisse Und Diskussionunclassified
“…(3)). [15], wobei der letzte Wert sehr zweifelhaft erscheint, da er die Summe der I±F-Kovalenzradien von 1,97 A Ê [16] um 21% unterschreitet. Interessant ist der Gang der Absta È nde I-ipso-C in der Reihe der C 6 F 5 IF n -Verbindungen mit n = 0, 2 und 4.…”
Section: Ergebnisse Und Diskussionunclassified
“…Because of its high etch rate and high selectivity against many metals, dielectrics, and polymers used in traditional integrated circuit fabrications, XeF 2 has been a widely used to etch Silicon isotropically etchant in microelectromechanical systems (MEMS) 1 processing since 1995 2 . XeF 2 is also used as a fluorination reagent in organic chemistry, due to its mild reactivity and high selectivity 3,4 While XeF 2 is a good etchant of silicon 5 , Al and Al 2 O 3 are among the materials which are not etched by XeF 2 and therefore are commonly used as structural materials.…”
mentioning
confidence: 99%
“…17 Moreover, many selectively fluoro-substituted organic compounds show a peculiar pharmacological and agrochemical properties. [18][19][20][21][22][23] Therefore, as a connection of our interest in the chemistry of the preparation of heterocyclic compounds from hydrazonoyl halides [24][25][26][27][28][29] and the above-mentioned findings, the present work is aimed at the preparation of new pyrazole, pyrazoline and their chromene fused derivatives incorporating fluorine and chlorine substituents into these derivatives hoping that it would potentiate their expected biological activities.…”
Section: Introductionmentioning
confidence: 99%