Record high extreme-ultraviolet efficiency at near-normal incidence from a multilayer-coated polymer-overcoated blazed ion-etched holographic grating

Kowalski, Michael P.; Cruddace, R. G.; Heidemann, Klaus; Lenke, Ralf; Kierey, Holger; Barbee, Troy W.; Hunter, W. R.

doi:10.1364/ol.29.002914

Cited by 24 publications

(21 citation statements)

References 11 publications

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“…To further improve the efficiency, a multilayer blazed grating (MBG) has to be used since its maximum groove efficiency (grating efficiency normalized by the corresponding multilayer reflectivity) in theory can reach 100% which cannot be realized with an AMG. 108,109 However, the challenge is the fabrication of the sharp and smooth triangular grooves with a perfect multilayer coating on top. Seely et al, cooperating with Carl Zeiss in Germany, have made remarkable progress on MBGs based on holographic pattering and ion etching.…”

Section: Multilayer Coated Gratingsmentioning

confidence: 99%

“…102,[110][111][112] An absolute diffraction efficiency of 30% (with a groove efficiency of 53%) was demonstrated using a Mo 2 C/ Si coated blazed grating at k ¼ 15.79 nm. 108 To further reduce the discrepancy between the measured efficiency of MBG and theory, the groove profile needs to be improved. An anisotropic chemical etching process of crystalline silicon is a promising method to make ideal blazed facets.…”

Section: Multilayer Coated Gratingsmentioning

confidence: 99%

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Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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Section: Multilayer Coated Gratingsmentioning

confidence: 99%

Section: Multilayer Coated Gratingsmentioning

confidence: 99%

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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“…FIGURE 1. Different approaches to obtain high resolution in the soft x-ray energy range: a) grating operating in high order [5]; b) blazed multilayer grating optimized for high order [6][7][8][9][10][11][12][13][14], c ) extremely high line density sliced grating working in the first order [5,[12][13][14].…”

Section: Introductionmentioning

confidence: 99%

“…Another approach that has been under development in different labs for the last two decades is based on blazed multilayer gratings optimized for high order [6][7][8][9][10][11][12][13] -Fig. 1b.…”

Section: Introductionmentioning

confidence: 99%

“…The performance of the blazed grating is determined by the surface quality and dimensional tolerances of the echellette substrate, as well as by the quality of the deposited multilayer. The developed fabrication methods based on interference lithography combined with ion-beam etching [7,10] and gray-scale e-beam lithography [8] allow currently to achieve a diffraction efficiency of 30-40% at the EUV wavelengths of 12-16 nm with a grating with the groove density up to 3000 grooves/mm optimized for diffraction in the first or the second order [7,8,11]. In the present work (see the next section), we report on fabrication details and experimental characterization of a blazed multilayer grating with 5000 grooves/mm optimized for third order diffraction of 14.2 nm EUV light [14].…”

Section: Introductionmentioning

confidence: 99%

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Ultra-high Resolution Optics for EUV and Soft X-ray Inelastic Scattering

Voronov¹,

Cambie²,

Ahn³

et al. 2010

AIP Conference Proceedings

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Abstract. We describe a revolutionary new approach to high spectral resolution soft x-ray optics. Conventionally in the soft x-ray energy range, high spectral resolution is obtained by use of a relatively low line density grating operated in 1 st order with small slits. This severely limits throughput. This limitation can be removed by use of a grating either in very high order, or with very high line density, if one can maintain high diffraction efficiency. We have developed a new technology for achieving both of these goals which should allow high throughput spectroscopy, at resolving powers of up to 10 6 at 1 keV. Such optics should provide a revolutionary advance for high resolution lifetime free spectroscopy, such as RIXS, and for pulse compression of chirped beams. We report recent developmental fabrication and characterization of a prototype grating optimized for 14.2 nm EUV light. The prototype grating with a 200 nm period of the blazed grating substrate coated with 20 Mo/Si bilayers with a period of 7.1 nm demonstrates good dispersion in the third order (effective groove density of 15,000 lines per mm) with a diffraction efficiency of more than 33%.

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Stellar And Galactic Environment survey (SAGE)

et al. 2008

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International audienceThis paper describes a proposed high resolution soft X-ray and Extreme Ultraviolet spectroscopy mission to carry out a survey of Stellar and Galactic Environments (SAGE). The payload is based on novel diffraction grating technology which has already been proven in a sub-orbital space mission and which is ready to fly on a satellite platform with minimal development. We discuss the goals of a SAGE base-line mission and demonstrate the scientific importance of high resolution spectroscopy in the Extreme Ultraviolet for the study of stars and the local interstellar medium

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Record high extreme-ultraviolet efficiency at near-normal incidence from a multilayer-coated polymer-overcoated blazed ion-etched holographic grating

Cited by 24 publications

References 11 publications

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Ultra-high Resolution Optics for EUV and Soft X-ray Inelastic Scattering

Stellar And Galactic Environment survey (SAGE)

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