2010
DOI: 10.1063/1.3431620
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Reduced low frequency noise in electron beam evaporated MgO magnetic tunnel junctions

Abstract: We compare low frequency noise in magnetic tunnel junctions with MgO barriers prepared by electron-beam evaporation with those prepared by radiofrequency sputtering, both showing a high tunneling magnetoresistance. The normalized noise parameter in the parallel state of junctions with evaporated barriers is at least one order of magnitude lower than that in junctions with sputtered barriers, and exhibits a weaker bias dependence. The lowest normalized noise is in the 10 −11 m 2 range. A lower density of oxygen… Show more

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Cited by 35 publications
(41 citation statements)
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“…Growth conditions have been previously observed to control the density of oxygen vacancies within the MgO [23]. In particular, adding O2 to the Ar plasma during MgO growth also helps in altering the oxygen population and the barrier performance [24].…”
Section: Device Preparation and Characterizationmentioning
confidence: 99%
“…Growth conditions have been previously observed to control the density of oxygen vacancies within the MgO [23]. In particular, adding O2 to the Ar plasma during MgO growth also helps in altering the oxygen population and the barrier performance [24].…”
Section: Device Preparation and Characterizationmentioning
confidence: 99%
“…The TMR was measured with the applied field along the original bottompinned layer direction, and an obvious linear response is obtained with a TMR ratio of 219%. It can be improved up to 250% by changing the applied field direction by 30 . Figure 2(a) summarizes the TMR ratios for several junctions against t Ru .…”
mentioning
confidence: 99%
“…In contrast to the bias dependence of TMR, ␣ AP in DMTJs and SMTJs varies asymmetrically with bias, reflecting dissimilar CoFeB/MgO interfaces in the MTJ stacks 11,13 and possibly more oxygen vacancies appearing at the top interfaces. 22 Importantly, V 1/2 in both ␣ and TMR for DMTJs is approximately double that for SMTJs. 10,12 The noise-bias dependence was also measured for the DMTJ at -45 mT, where only the magnetization of the bottom pinned CoFeB layer switches.…”
mentioning
confidence: 96%
“…High vacuum postannealing was performed in the temperature range of 250-375°C in an applied magnetic field of 800 mT for 1 h. The magnetotransport and noise measurements are conducted as described in our previous publication. 22 Positive bias represents electron flow from top to bottom CoFeB layers. Figure 1 shows the resistance-area product ͑RA͒ versus magnetic field of a DMTJ with the CoFe 2 nm/CoFeB 0.8 nm free layer at T a = 375°C.…”
mentioning
confidence: 99%
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