Relationship between field emission characteristics and hydrogen content in diamondlike carbon deposited by the layer-by-layer technique using plasma enhanced chemical vapor deposition

Abstract

Articles you may be interested inGrowth and electron field emission characteristics of nanodiamond films deposited in N 2 / CH 4 / H 2 microwave plasma-enhanced chemical vapor deposition Field emission of nitrogen doped diamondlike carbon films deposited by plasma enhanced chemical vapor deposition J.We deposited diamondlike carbon ͑DLC͒ films of various hydrogen contents by plasma enhanced chemical vapor deposition. The hydrogen content in the DLC film was controlled by a novel technique called a layer-by-layer deposition, in which the deposition of a thin layer of DLC and a CF 4 plasma exposure on its surface were carried out alternatively. The DLC films with different hydrogen content could be obtained by varying the CF 4 plasma exposure time. The emission current increases and turn-on field decreases with decreasing hydrogen content in the DLC film.