Relationship between the optical and mechanical properties of fluorinated amorphous carbon thin films

c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films

“…These bands depict a clear evolution, both in position and relative intensity, from DLC and F‐DLC to CF X . In the two former cases, the shape of the Raman spectra, resulting from the contribution of these two bands, is similar to that reported for amorphous hydrogenated carbon films (a‐C:H) and partially fluorinated DLC films while, in the latter, it is similar to polymeric highly fluorinated carbon films …”

“…The FT‐IR spectra reported in Figure (bottom) confirms this view. According to the attribution in literature of similar bands and peaks in carbon and fluorinated carbon materials, a first evidence from these spectra is that sp 2 bond structures (i.e., CH x F y CH x F y bands at around 1 700 cm −1 and CH x CH x bands at around 2 900 cm −1 ) are only present in DLC and F‐DLC , with more intense CH x bands in DLC than in F‐DLC . Meanwhile, the intensity of the bands attributed to CF 2 groups is quite high for both F‐DLC and CF X films, with a broader shape in the former case that reveals a more heterogeneous local environment.…”

“…Studies by mass spectrometry of the species produced during deposition of magnetron sputtered CF n films are also available in literature . Meanwhile, plasma synthesis of fluorinated DLC films and other fluorinated carbon films by using CF 4 as fluorine precursor has been the subject of numerous works, although in the majority of these investigations the emphasis was put on the materials properties rather than on the relationships with the plasma characteristics. Similar works, but using c ‐C 4 F 8 and other fluorinated hydrocarbons as fluorine precursors, can be also found in the recent literature on fluorinated carbon films …”

Hydrophobic, mechanical, and tribological properties of fluorine incorporated hydrogenated fullerene-like carbon films

“…As the CF 4 gas flow increases further, the fluorine content increases from 1.21 at.% (F-FLC2) to 2.1 at.% (F-FLC3). The result implies that the fluorine content can be adjusted by varying the CF 4 gas flow, which is consistent with the results of many studies [22][23][24]. Furthermore, the deposition rate of the films still increased slightly from 3.3 nm/min to 3.9 nm/min as the CF 4 gas flow increased from 0 to 3 sccm.…”

Nanoindentation investigation of amorphous hydrogenated carbon thin films deposited by ECR-MPCVD

“…Amorphous hydrogenated carbon thin films were subjected to a depth-sensing nanoindentation, which is a reliable method [26,27] for measuring the mechanical properties of thin films. The typical continuous loaddisplacement curves are obtained from a Berkovich indenter.…”