1999
DOI: 10.1002/(sici)1521-4125(199906)22:6<527::aid-ceat527>3.0.co;2-5
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Removal of Nitric Oxide in a Pulsed Corona Discharge Reactor

Abstract: Conversion of nitric oxide (NO) in a pulsed corona discharge reactor was investigated. Relative importance of each of the active species such as O, OH, HO 2 and O 3 produced by corona discharge was evaluated with respect to the oxidation of NO to NO 2 . Of those species, O 3 was found to be the most important one in the oxidation of NO. In order to reduce the energy required to convert NO, olefins (ethylene, propylene) were used as additive, and the scheme for the oxidation of NO promoted by the hydrocarbon wa… Show more

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Cited by 27 publications
(15 citation statements)
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“…At ambient temperature, O 3 was proved to play an important role in the oxidation of NO (via R9). (25) However, as we can see from the rates of R10 and R11 (listed in Table I), formation of O 3 decreases a lot with the increase in temperature and, moreover, the decomposition of O 3 to O 2 becomes significant as the temperature increases. Consequently, at 523 K, the dominant reaction for NO oxidation to NO 2 is R6.…”
Section: No/o 2 /N 2 Systemmentioning
confidence: 99%
“…At ambient temperature, O 3 was proved to play an important role in the oxidation of NO (via R9). (25) However, as we can see from the rates of R10 and R11 (listed in Table I), formation of O 3 decreases a lot with the increase in temperature and, moreover, the decomposition of O 3 to O 2 becomes significant as the temperature increases. Consequently, at 523 K, the dominant reaction for NO oxidation to NO 2 is R6.…”
Section: No/o 2 /N 2 Systemmentioning
confidence: 99%
“…6 shows the concentration profiles of NO as a function of energy density at different temperatures. In a gas mixture of the present case, the NO removal takes place mainly by its oxidation to NO [7], [8], [26]. At room temperature, NO was easily depleted.…”
Section: Resultsmentioning
confidence: 68%
“…일반적인 IPA 제거방법으로 습식 스크러버(scrubber)와 열산화 방 법이 알려져 있으나 [7], 흡수법은 단순히 오염물질을 기상에서 액상으 로 전달하므로 2차적인 수질오염 문제를 야기하고, 750 ℃ 이상의 고 온을 필요로 하는 열산화 방법은 높은 연료비용과 특수한 내열 소재 를 사용해야 하는 문제점이 있다 [3]. 그밖에 촉매 혹은 광촉매 공정, 저온 플라즈마 공정 및 플라즈마-촉매 하이브리드 시스템 등이 연구 되고 있다 [7][8][9][10][11]. 촉매산화 공정은 비교적 낮은 온도에서 VOCs를 산 화시킬 수 있어 열산화 공정에 비해 적은 운전비용으로 유해가스를 처리할 수 있다 [12].…”
Section: 및 세정제로 널리 사용되고 있는 물질이다 특히 디스크헤드와 레이 저의 렌즈 광학 디스크 드라이브 및 액정unclassified