Research on polishing technology based on surface contact MRF

Abstract

A novel polishing technology based on surface-contact MRF is introduced. The principle, the magnetic field structure and the mode of motion of this polishing method are described. Through development of uniform ring-like magnetic field, the relevant mechanical device and circulatory system-delivered MRF from the magnetic field center are designed. By using the orthogonal experimental technique on this system, the polishing experiment for the plane K9 glass of Ф 60 is carried out. The experiment result is examined on a Non-contact interferometer Taylor Surf CCI2000. It analyzed the influence of surface roughness and material elimination quantity under the velocity of the principle axis, the intensity of the magnetic field, the velocity of even pendulum of the magnetic pole, the distance between the work-piece and the pole. The diagrams of surface roughness and material elimination quantity under the above craft parameter are given. And the best craft parameter combination is obtained. It is showed by research and experiment that the roughness of the experimental work piece can decrease to Ra 0.86nm from Ra 284.1nm in 50 min under the craft parameter. The intensity of magnetic field 1800G, the velocity of the principle axis 490 rpm, the velocity of even pendulum of the magnetic pole 8rpm, the distance between the work-piece and the pole 1mm are all described.