2023
DOI: 10.1039/d2nr05413b
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Revealing the stochastic kinetics evolution of photocatalytic CO2reduction

Abstract: Investigating kinetic mechanisms to design efficient photocatalysts is critical for improving photocatalytic CO2 reduction, but the stochastic photo-physical/chemical properties of kinetics remain unclear. Herein, we propose a statistical study to...

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Cited by 4 publications
(2 citation statements)
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“…However, a pronounced shoulder peak at low BE appeared only in the In 3d 5/2 spectra as the position approached the interface. The peak shi toward higher BE in the O 1s spectra near the interface with ALD-Al 2 O 3 , 30,31 the shoulder peak, 28,32 and/or the peak shi [30][31][32] in the metal core level spectra of the underlying metal oxides were the key features in the 2DEG phenomenon induced by the TMA. In other words, the peak shis in Al 2p and O 1s, and the shoulder peak of In 3d 5/2 in Fig.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…However, a pronounced shoulder peak at low BE appeared only in the In 3d 5/2 spectra as the position approached the interface. The peak shi toward higher BE in the O 1s spectra near the interface with ALD-Al 2 O 3 , 30,31 the shoulder peak, 28,32 and/or the peak shi [30][31][32] in the metal core level spectra of the underlying metal oxides were the key features in the 2DEG phenomenon induced by the TMA. In other words, the peak shis in Al 2p and O 1s, and the shoulder peak of In 3d 5/2 in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…20 TMA is known to be a strong reducing agent, [27][28][29] which itself desires to be oxidized. The capability of TMA to reduce neighboring species has been the main cause of defect-rich interfaces, forming a two-dimensional electron gas (2DEG) between ALD-Al 2 O 3 and bottom binary oxides such as TiO 2 , 28,29 ZnO, 27,30 and In 2 O 3 . 31,32 Likewise, the quaternary oxide IGZO was chemically reduced when exposed to the ALD-Al 2 O 3 process, creating a defect-rich interface.…”
Section: Introductionmentioning
confidence: 99%