RF magnetron sputtering of Bi₁₂TiO₂₀ thin films on various substrates

Abstract

Using RF magnetron sputtering, we deposited Bi12TiO20 (BTO) thin films on various substrates (glass, quartz, stainless steel (SS304), (001) and (111) Si and sital-ceramics, Al and Cu foils). The films had a constant thickness of 1.3 μm. The as-deposited films were studied by Raman spectroscopy, scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX), as well as by grazing incidence X-ray diffractometry (GIXRD). The GIXRD results reveal that the films are amorphous, while the Bi/Ti ratio varies between 9.5/1 and 11.8/1, as shown by the energy dispersive X-ray analysis (EDX). Further, the films deposited on glass and SS304 substrates were modified by laser irradiation (CuBr laser with a wavelength λ = 511 nm) to obtain an ordered cubic phase. The films deposited on quartz and on (001) and (111) Si substrates were thermally annealed at about 510 oC for three hours in ambient atmosphere. The modified films were characterized by Raman spectroscopy, scanning electron microscopy (SEM), EDX and X-ray diffractometry.