Roughness Control by Adjusting the Annealing Parameters of In&lt;SUB&gt;2&lt;/SUB&gt;S&lt;SUB&gt;3&lt;/SUB&gt; Thin Films Prepared by Thermal Evaporation Deposition

Izadneshan, Heydar; Gremenok, V. F.; Сильванович, Дмитрий Александрович

doi:10.1166/jamr.2014.1184

J. Adv. Microsc. Res.

2014

DOI: 10.1166/jamr.2014.1184

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Roughness Control by Adjusting the Annealing Parameters of In<SUB>2</SUB>S<SUB>3</SUB> Thin Films Prepared by Thermal Evaporation Deposition

Heydar Izadneshan¹,

V. F. Gremenok²,

Дмитрий Александрович Сильванович³

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Roughness Control by Adjusting the Annealing Parameters of In<SUB>2</SUB>S<SUB>3</SUB> Thin Films Prepared by Thermal Evaporation Deposition

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