2016
DOI: 10.1016/j.vlsi.2016.07.002
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Row-structure stencil planning approaches for E-beam lithography with overlapped characters

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(1 citation statement)
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“…This method is a kind of technology using a series of produce procedure to deprive specific section on target surfaces, forming micro‐/nanohierarchical structures. The lithography includes photolithography, electron‐beam (e‐beam) lithography, X‐ray lithography, nanoimprint lithography, and colloidal lithography (soft lithography) . Traditional lithography will choose a flat plate as mask surface.…”
Section: Fabrication Of Superhydrophobic Surfacementioning
confidence: 99%
“…This method is a kind of technology using a series of produce procedure to deprive specific section on target surfaces, forming micro‐/nanohierarchical structures. The lithography includes photolithography, electron‐beam (e‐beam) lithography, X‐ray lithography, nanoimprint lithography, and colloidal lithography (soft lithography) . Traditional lithography will choose a flat plate as mask surface.…”
Section: Fabrication Of Superhydrophobic Surfacementioning
confidence: 99%