Sample Damage during XPS Measurement

Abstract

X-ray photoelectron spectroscopy (XPS) has been widely used for the surface analysis technique. The analysis depth (inelastic mean free path or photoelectron escape depth) is several nm, and it is possible to identify the elements existing on the sample surface, the apparent elemental composition, and the imaging of specific elements. It is also possible to estimate the surface layered structure by using some analysis methods. Due to these advantages, it is also used for the evaluation of organic materials such as polymers, monolayers and LB films. In some cases, however, accurate information cannot be obtained due to the decomposition of those materials by the irradiation of X-ray. Here, I will explain how to evaluate the decomposition characteristics of polymer materials and monomolecular films on solid surfaces, and how to determine sample damaging factors using reference substances.