Secondary electron emission from glass and its practical applications

Oôka, Kazuo; Dunn, B.; MacKenzie, J. D.

doi:10.1016/0022-3093(73)90051-3

Cited by 24 publications

(5 citation statements)

References 32 publications

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“…The characteristics of SEE included spectrum [15], angular distribution [16], and total secondary electron emission yield (SEY). The latter shown in gure 1 consists of inelastic backscattering [17] and 'true' secondary emission [18,19]. The term ' rst crossover energy' E co1 is the key term for understanding processes described below: SEY(E co1 ) = 1.…”

Section: Model and Geometrymentioning

confidence: 99%

Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam

Krainov

Ivanov

Astakhov

et al. 2020

Plasma Sources Sci. Technol.

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A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from the combination of these two sources with the help of particle-in-cell simulation to investigate the particle lofting phenomenon. The results are of interest for dust mitigation in the semiconductor industry, the lunar exploration, and the explanation of the dust levitation.

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Section: Model and Geometrymentioning

confidence: 99%

Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam

Krainov

Ivanov

Astakhov

et al. 2020

Plasma Sources Sci. Technol.

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show abstract

“…Two last processes were merged into one process of SEE due to the lack of experimental data that did not allow to separate those processes entirely. The characteristics of SEE included secondary electron emission yield (inelastic backscattering [12], "true" secondary emission [13,14]), the spectrum of secondary electrons from silicon dioxide [15] and angular distribution [16].…”

Section: Model and Geometrymentioning

confidence: 99%

Dielectric particle lofting from dielectric substrate exposed to low energy electron beam

Krainov,

Ivanov,

Astakhov

et al. 2020

Preprint

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The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low energy electron beam. The article discusses the electron accumulation between such a substrate and a particle lying on it, that can cause a particle lofting. The results are of interest for dust mitigation in the semiconductor industry, the lunar exploration and the explanation of the dust levitation.

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“…The glass deposition techniques affect the composition of the samples as shown by Robertson and Owen (22) . For the Mackenzie (20) . Hence, the surface potential has to be less than this and was, in fact, kept at -10 volts.…”

Section: B Results and Experimental Methodsmentioning

confidence: 99%

Secondary emission of chalcogenide glasses

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Secondary electron emission from glass and its practical applications

Cited by 24 publications

References 32 publications

Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam

Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam

Dielectric particle lofting from dielectric substrate exposed to low energy electron beam

Secondary emission of chalcogenide glasses

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