“…There are also a growing number of evidences emerged in the last decades that anomalous nanoscale broadening of interfaces or long-range diffusity tail in the impurity concentration profile occur during ion-irradiation or sputtering [16][17][18][19][20][21]15,[22][23][24][25][26][27][28][29][30][31], sputter deposition and thin film growth [32,33] or cluster burrowing [36]. In these cases it can be shown that the magnitude of diffusivity of impurities is beyond the energy range of the implanted ions or clusters [17,15,36].…”