Si-K_αradiation generated by the interaction of femtosecond laser radiation with silicon

Abstract

Generation of optical pulses of duration down to 8 fs upon filamentation of collimated femtosecond laser radiation in argon M V Kurilova, D S Uryupina, A V Mazhorova et al. Abstract. Controlling the absorption mechanism, e.g. inverse Bremsstrahlung and resonant absorption, the emission of Si-K α -radiation using focused femtosecond laser radiation (t p = 100fs, λ = 850 nm, I = 20 PW/cm²) has been investigated. The emission Si-K α -radiation has been improved with double pulses, varying the delay, the energy ratio between pre-and mainpulse and the focal position. The efficiency for double-pulse-generation of Si-K α -radiation has been increased 4 times compared to single pulse generation.

Study on X-ray Emission Using Ultrashort Pulsed Lasers in Materials Processing

“…It becomes obvious that the temporal delay between the pulses will also affect X-ray emission when considering plasma resonance absorption as the dominant optical transfer mechanism for low-intensity pulses [ 28 ]. As already stated above, this is due to the fact that the actual shape of both the laser ablation plume and the critical plasma density layer is continuously changing with time.…”