SiGe CMOS fabrication using SiGe MBE and anodic/LTO gate oxide

Abstract

Two names have been omitted from the original list of authors. The correct list should read: R M Sidek , U N Straube , A M Waite , A G R Evans , C Parry , P Phillips , T E Whall , E H C Parker , L S Riley§ and S Hall§ ECS Department, University of Southampton, Southampton SO17 1BJ, UK Department of Physics, University of Warwick, Coventry, CV4 7AL, UK § Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, L69 3GJ Liverpool, UK