2021
DOI: 10.48550/arxiv.2112.09765
|View full text |Cite
Preprint
|
Sign up to set email alerts
|

SiGe quantum wells with oscillating Ge concentrations for quantum dot qubits

Help me understand this report
View published versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
14
0

Year Published

2022
2022
2022
2022

Publication Types

Select...
3
1

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(14 citation statements)
references
References 30 publications
0
14
0
Order By: Relevance
“…One of them suggests back-gates for controlling the electric field across the QD independent from the QD filling [108]. Another approach uses engineering of the Ge profile across the Si/SiGe heterostructure [74,109]. A third method relies on increasing random fluctuations of alloy composition (Ge concentration in Si QW), which statistically increases average E VS,0 [71], but at the cost of larger variance.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…One of them suggests back-gates for controlling the electric field across the QD independent from the QD filling [108]. Another approach uses engineering of the Ge profile across the Si/SiGe heterostructure [74,109]. A third method relies on increasing random fluctuations of alloy composition (Ge concentration in Si QW), which statistically increases average E VS,0 [71], but at the cost of larger variance.…”
Section: Discussionmentioning
confidence: 99%
“…On the other hand, the perturbations having characteristic length scales comparable to lattice spacing (e.g. atomic steps at interface of the quantum well [72]) can severely affect not only E VS , but also the composition of valley eigenstates [46,60,61,71,73,74]. Driving the spatial degrees of freedom of the electron in presence of such perturbations can lead to transitions between the two valley states.…”
Section: Introductionmentioning
confidence: 99%
“…The orbital energy gap is determined by the electrostatic confinement of the quantum dot. The valley energy gap can be made large in a Si-MOS quantum dot with a strong vertical field to force the electron against the interface [64,65] and can be made large in Si/SiGe devices with alloy engineering [66,67].…”
Section: Two-qubit Error Channelsmentioning
confidence: 99%
“…This is not unreasonable. For Si/SiGe quantum dots, the fixed alloy composition largely dictates the valley phase [66,67,[71][72][73][74][75][76]. For Si-MOS quantum dots, the position of the oxide interface largely dictates the valley phase, given a sufficient vertical electric field [19,64,65].…”
Section: B Correlated ẑ ⊗ ẑmentioning
confidence: 99%
“…Indeed, a number of publications consider it as a challenge to be overcome or to do away with (see, e.g., Refs. [1,[8][9][10]), whereas a second group of publications (see, e.g., Refs. [11][12][13][14][15]) considers it as a potential resource to be further explored.…”
Section: Introductionmentioning
confidence: 99%