Simulation of Process Parameters Towards the Generation of Low Spatial Frequency Lipss on Dielectric Materials

Abstract

In this paper we show simulations of low spatial frequency laser-induced period surface structures (LSFL) and deduce appropriate process parameters for their specific experimental generation on dielectrics. We employed the established efficacy factor theory to forecast the periodicity and the orientation of low spatial frequency laser-induced period surface structures including a Drude-model to determine the required carrier density for LSFL generation. This approach is applied exemplarily to the LSFL generation on fused silica. We extend the theoretical approach by a rate equation based calculation of the required laser fluence to excite the necessary carrier density by photo-and avalanche ionization using ultra-short pulsed laser irradiation.