Nanophotonics Australasia 2017 2018
DOI: 10.1117/12.2282606
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Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices

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Cited by 5 publications
(4 citation statements)
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“…Beyond that, sub-5 nm alignment accuracy is given. SPL also shows great potential for forming 3D structures at comparable scales [88,89,92].…”
Section: Discussionmentioning
confidence: 99%
“…Beyond that, sub-5 nm alignment accuracy is given. SPL also shows great potential for forming 3D structures at comparable scales [88,89,92].…”
Section: Discussionmentioning
confidence: 99%
“…Well-established methodologies incorporating precise engineering control have made lithographic patterning techniques capable of developing 3D entities at the nanoscale [ 30 , 31 , 32 , 33 , 34 ]. Using the techniques, a variety of 3D constructs have been developed with different applications in biomedical devices [ 35 , 36 , 37 , 38 ], optoelectronics and electronics [ 39 , 40 , 41 , 42 ], microelectromechanical systems [ 43 , 44 ], and sensors [ 45 , 46 , 47 , 48 ]. However, these methods combine high costs with a relatively slow process, making the duration of production problematic.…”
Section: Introductionmentioning
confidence: 99%
“…Scanning probe lithography (SPL), especially FE-SPL, is a powerful tool for nanoscale patterning [27][28][29][30][31]. It provides an accessible, easy-to-operate, and cost-effective alternative compared to other high-resolution patterning techniques.…”
Section: Introductionmentioning
confidence: 99%
“…The scattering range is spatially small, which expressively shrinks the proximity effect. FE-SPL was thus employed for the demonstration of nanoscale devices such as split-ring resonators, photon detectors, quantum devices, and transistors [29,30,32,33].…”
Section: Introductionmentioning
confidence: 99%