SOI and Other Semiconductor-On-Insulator Substrates Characterization

Abstract

We focus in this paper on SOI and new engineered on-insulator substrates characterization. After a short review of on-line characterization techniques, we will detail off-line monitoring techniques such as preferential etching and Raman spectroscopy. We will especially highlight their complementarities on strained layers and the need for a proper evaluation of structural quality of on-insulator substrates.