“…In this sense, the development of devices applied to industrial processes [ 1 ], home security [ 2 ], monitoring of air quality [ 3 ] and explosives [ 4 ], and the detection of pollutants [ 5 ] and toxic compounds [ 6 ] are essential, in addition to wearable devices used as accessories and implants [ 7 ]. The manufacturing process of devices can involve a broad range of deposition techniques, such as sol-gel process [ 8 , 9 , 10 , 11 , 12 ], sputtering [ 13 , 14 ], chemical vapor deposition (CVD) [ 15 ], plasma spray [ 16 , 17 ], microwave-assisted synthesis [ 18 , 19 ], and the disruptive technique atomic layer deposition (ALD) [ 20 , 21 , 22 ]. Among them, ALD stands out for its unique capabilities, which include the complex shapes coverage embedded in high conformal 3D areas [ 23 ], the growth of stacked monolayers of different nanomaterials [ 24 ], and the growth of thin films precisely defined by self-limited surface reactions [ 25 , 26 , 27 , 28 , 29 ].…”