2018
DOI: 10.7567/apex.11.053004
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Spin and valley filter across line defect in silicene

Abstract: We propose a new scheme to achieve an effective spin/valley filter in silicene with extended line defect on the basis of spin-valley coupling due to the intrinsic spin-orbit coupling (SOC). The transmission coefficient of the spin/valley states is seriously affected by the SOC. When a perpendicular magnetic field is applied on one side of the line defect, one valley state will experience backscattering, but the other valley will not; this leads to high valley polarization in all transmission directions. Moreov… Show more

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Cited by 30 publications
(34 citation statements)
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“…Researchers of late, have started paying attention to Group-IV elements based two dimensional (2D) materials such as silicene [1][2][3][4][5][6][7], germanene [8] and stanene [8] owing to their similarity in electronic properties with graphene and their possible application in nanoelectronic devices [9]. Among these, stanene has drawn keen interest due to it's possible application as quantum hall insulator [10], topological insulator [11] and topological superconductor [12].…”
Section: Introductionmentioning
confidence: 99%
“…Researchers of late, have started paying attention to Group-IV elements based two dimensional (2D) materials such as silicene [1][2][3][4][5][6][7], germanene [8] and stanene [8] owing to their similarity in electronic properties with graphene and their possible application in nanoelectronic devices [9]. Among these, stanene has drawn keen interest due to it's possible application as quantum hall insulator [10], topological insulator [11] and topological superconductor [12].…”
Section: Introductionmentioning
confidence: 99%
“…We model the electronic structure of the graphene line defect shown in Fig. 1 by a nearest-neighbor tight-binding Hamiltonian [13,31,32]…”
Section: Modelmentioning
confidence: 99%
“…Recently, the extended line defects (ELDs) in silicene have been extensively investigated according to first-principles calculations[15, 16], and the 5-5-8 ELD (abbreviated as "line defect” in the following) was found to be the most stable and most readily formed structure. The spin and valley polarization of the silicene line defect have been investigated theoretically[1719]. The formation of a line defect can be visualized as the stitching of the zigzag edges of two Si grains by the adsorbed Si atoms, where either side of the line defect shows pseudoedge-state-like behavior and the grain boundaries of the zigzag edge act as the pseudo-edge[16].…”
Section: Introductionmentioning
confidence: 99%