Spontaneous Registration of Sub-10 nm Features Based on Subzero Celsius Spin-Casting of Self-Assembling Building Blocks Directed by Chemically Encoded Surfaces

Abstract

For low-cost and facile fabrication of innovative nanoscale devices with outstanding functionality and performance, it is critical to develop more practical patterning solutions that are applicable to a wide range of materials and feature sizes while minimizing detrimental effects by processing conditions. In this study, we report that area-selective sub-10 nm pattern formation can be realized by temperature-controlled spin-casting of block copolymers (BCPs) combined with submicron-scale-patterned chemical surfaces. Compared to conventional room-temperature spin-casting, the low temperature ( e.g., -5 °C) casting of the BCP solution on the patterned self-assembled monolayer achieved substantially improved area selectivity and uniformity, which can be explained by optimized solvent evaporation kinetics during the last stage of film formation. Moreover, the application of cold spin-casting can also provide high-yield in situ patterning of light-emitting CdSe/ZnS quantum dot thin films, indicating that this temperature-optimized spin-casting strategy would be highly effective for tailored patterning of diverse organic and hybrid materials in solution phase.

Rapid and Selective Deposition of Patterned Thin Films on Heterogeneous Substrates via Spin Coating

“…25,26 In addition, Lee et al selectively deposited block copolymers on patterned surfaces via careful temperature control. 27 Despite promise, there still remains significant uncertainty surrounding the design rules that govern spin dewetting as a function of material selection and processing. Here, we systematically investigate SAMpromoted spin dewetting using homogeneous (SiO 2 ) and heterogeneous (Cu/SiO 2 ; TiN/SiO 2 ) substrates that are relevant to the microelectronics industry.…”

“…To address this opportunity, our attention was drawn to a technique known as spin dewetting, which results in the local segregation of polymers during spin coating and requires no postprocessing or additional steps to generate patterns. , Past work has highlighted the simplicity of spin dewetting in comparison to more complex patterning methodologies . Bhandaru et al explored using topographic poly­(dimethylsiloxane) substrates and demonstrated an impressive array of resulting polymer structures depending on prepattern dimensions and coating conditions. , In addition, Lee et al selectively deposited block copolymers on patterned surfaces via careful temperature control . Despite promise, there still remains significant uncertainty surrounding the design rules that govern spin dewetting as a function of material selection and processing.…”

Micro-to-nanometer patterning of solution-based materials for electronics and optoelectronics

“…The S-CSC procedure with a block-copolymer was a uniform micro-pattern form-factor for nanoscale patterning via a simple solution-based spin casting procedure. 13 …”

“…Here, we introduce state-of-the-art patterning techniques of SBMs to fabricate micro-to-nanometer scale patterns. This work introduces the printing methods, 11,12 solution ordering from surface treatment, 13 nano-imprinting, 14,15 transfer printing, 16,17 and modied photolithography method 18,19 to explain the current state of the patterning technology of SBMs. Additionally, various applications, which include various optoelectronics with integrated patterns, are introduced to explain the effects of each patterning procedure.…”

Perpendicularly aligned nanodomains on versatile substrates via rapid thermal annealing assisted by liquid crystalline ordering in block copolymer films

“… 26,34 Much attention has thus been focused on this BCP and related ones with incorporated segments to improve their performance in next-generation lithography. 35,36 However, to date, it has remained a formidable challenge to obtain normally aligned cylindrical or lamellar domains within BCP films with small feature sizes on versatile substrates by rapid thermal annealing (such as several minutes) at low temperatures.…”