Sputter deposition with powder targets: An overview

Depla, Diederik

doi:10.1016/j.vacuum.2020.109892

Cited by 11 publications

(4 citation statements)

References 157 publications

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“…Hence, the sputtering parameters play a significant role in determining the film quality. Also, sputtered powder targets, according to Depla (Depla, 2021) are a fascinating laboratory method for examining material characteristics because they enable flexible investigation of the effects of material chemical composition attributes without interrupting the experimental setup.…”

Section: I)mentioning

confidence: 99%

Sputtering of high entropy alloys thin films: An overview

Oladijo,

Akinlabi,

Mwema

et al. 2024

10.5267/j.esm

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For the past 19 years, high entropy alloys (denoted as HEAs) have piqued the interest of many researchers due to their unique properties. Sputtering High Entropy Alloys on bulk materials, on the other hand, have been widely utilized due to their low cost of manufacture. This paper reviews the most recent trends and advancements in sputtered HEA coatings, thin film research, and development. Firstly, HEA coating and thin films were introduced. Then, a look at sputtering technologies and procedures is presented, followed by a summary of recent research on sputtered HEA thin films, properties, and applications. From reviewed literature, it can be deduced that HEAs that include the full nitride element have greater mechanical and elastic properties, and HEAs generally have the potential for structural, industrial, biomedical, and energy applications. Finally, it is suggested that new stable HEA films and coating research initiatives with various materials be undertaken to widen its applications.

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Section: I)mentioning

confidence: 99%

Sputtering of high entropy alloys thin films: An overview

Oladijo,

Akinlabi,

Mwema

et al. 2024

10.5267/j.esm

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“…In terms of the intensity of publications in this area, the group from Ghent University can confidently be given second place after the group of Professor Berg. The results of experimental studies of reactive sputtering and the properties of the obtained films of oxides, nitrides, etc., were published in articles [73,[97][98][99][100][101][102][103][104][105][106][107][108][109][110][111][112][113][114][115]. Various aspects of reactive sputtering modeling are described by the researchers of the team in publications [65,.…”

Section: Isothermal Model Of Depla (The Rsd Model)mentioning

confidence: 99%

Modeling of Reactive Sputtering—History and Development

Шаповалов

2023

Materials

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This work critically reviews the evolution of reactive sputtering modeling that has taken place over the last 50 years. The review summarizes the main features of the deposition of simple metal compound films (nitrides, oxides, oxynitrides, carbides, etc.) that were experimentally found by different researchers. The above features include significant non-linearity and hysteresis. At the beginning of the 1970s, specific chemisorption models were proposed. These models were based on the assumption that a compound film was formed on the target due to chemisorption. Their development led to the appearance of the general isothermal chemisorption model, which was supplemented by the processes on the surfaces of the vacuum chamber wall and the substrate. The model has undergone numerous transformations for application to various problems of reactive sputtering. At the next step in the development of modeling, the reactive sputtering deposition (RSD) model was proposed, which was based on the implantation of reactive gas molecules into the target, bulk chemical reaction, chemisorption, and the “knock-on effect”. Another direction of the modeling development is represented by the nonisothermal physicochemical model, in which the Langmuir isotherm and the law of mass action are used. Various modifications of this model allowed describing reactive sputtering processes in more complex cases when the sputtering unit included a hot target or a sandwich one.

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“…To evaluate the suitability of AZO thin films for optoelectronic applications, the optical and electrical properties were combined to calculate the figure of merit (FOM) using the following equation [42], [43]: (6) where TVIS and Rs are the average transmittance in the visible region from 380 to 780 nm and the sheet resistance, respectively. Figure 14 shows the FOM calculated from TVIS and Rs to determine the optimum bulk density of the powder target.…”

Section: E Figure Of Meritmentioning

confidence: 99%

“…For example, this enables production of thin films using low-melting-point organic light-emitting diode (OLED) materials. In addition, when comparing targets of the same type and size, the cost of the powder was reduced to 1/1000 of that of solid materials [5], [6]. However, only a few examples of powder targets have been reported, and thus, the…”

Section: Introductionmentioning

confidence: 99%

Sputtering Deposition With Low Cost Multi-Element Powder Targets

Ohshima

2023

IEEE Open J. Nanotechnol.

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Compared to solid target, powder target is low cost and can be varied in wide range of elemental combinations. Transparent and conductive aluminum-doped zinc oxide (AZO) thin films were prepared by sputter deposition using a mixed powder target consisting of zinc oxide and aluminum oxide powders at 98:2 wt%. The bulk density of the powder target can be varied depending on the pressing pressure. Therefore, AZO thin films were prepared on Si and sapphire substrates using powder targets with different bulk densities (ρpowder) ranging from 0.898 to 3.00 g/cm 3 . The fabricated structural, electrical, and optical properties of the AZO thin films were examined, and the relationships between the target bulk density and film properties were investigated. X-ray diffraction measurements revealed c-axis ZnO (002) diffraction peaks, corresponding to crystallite growth oriented perpendicular to the substrate. Hall effect measurements showed n-type conductivity, with carrier density and Hall mobility increasing as the bulk density of the powder target increased. At ρpowder = 3.00 g/cm 3 , the AZO thin film on the Si substrate showed the lowest resistivity of 1.35×10 -3 Ω•cm. UV-visible spectroscopy measurements showed that the average transmittance in the visible light region exceeded 80% for the AZO thin films on the sapphire substrates. The figure of merit was calculated as a measure of the potential application in optoelectronic devices, resulting in 6.37×10 -3 Ω -1 for ρpowder = 3.00 g/cm 3 . This research contributes to Nagasaki University's goal of "planetary health".

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Sputter deposition with powder targets: An overview

Cited by 11 publications

References 157 publications

Sputtering of high entropy alloys thin films: An overview

Sputtering of high entropy alloys thin films: An overview

Modeling of Reactive Sputtering—History and Development

Sputtering Deposition With Low Cost Multi-Element Powder Targets

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