Abstract:Polycrystalline indium tin oxide (ITO) films were prepared on glass substrates by radio frequency (RF) sputtering system from a high density target (90wt. In 2 O 3 and 10 wt. %SnO 2). X-ray diffraction (XRD) and Scanning Electron Microscopy (SEM) experiments were performed to study the structure and the surface morphology of these samples. The results show that the as-deposited ITO thin films deposited on glass have a <100> texture, as the film grows the preferred orientation changes from <100> to <111>. The l… Show more
“…The coating appears to be dense granular with average grain size varying in between 50 to 100 nm. Similar SEM images of ITO thin film deposited by sputtering and e-beam evaporation were also taken by previous researchers and were found to have dense granular structure [L. Kerkache et al, 2010;Shui-Yang Lien, 2010].…”
Section: Scanning Electron Microscopy (Sem)supporting
confidence: 74%
“…1 ITO is a very important transparent conducting oxide (TCO) and has applications in variety of fields such as flat panel displays, light emitting diodes, solar cells and optical coatings [L. Kerkache et al, 2010;Minami et al, 2005;Venkat et al, 2006;T. K. Kim et al, 2009].…”
Indium thin oxide (ITO) films have been used in solar cell applications as top conducting layers for many years. These films possess very good transmission and a low sheet resistance thus making them ideal candidate material for top conducting layers in thin film and HIT solar cells. In the present work, ITO films have been deposited over soda lime glass substrates for use as defogger applications, and for use as front contact electrode in HIT type solar cells as well. ITO deposition is done using pulsed DC sputtering technique inside a vacuum chamber with large size ITO sputtering target of 15 inches by 5 inches. Silver bus bars are printed at the two edges of glass using thick film screen printing technique and the firing of thick film is done in a belt furnace. The deposited ITO thin film characterization is done by
using XRD, SEM and 4 probe sheet resistance measurement techniques. The transmission spectra is analyzed for optical transmission properties.
“…The coating appears to be dense granular with average grain size varying in between 50 to 100 nm. Similar SEM images of ITO thin film deposited by sputtering and e-beam evaporation were also taken by previous researchers and were found to have dense granular structure [L. Kerkache et al, 2010;Shui-Yang Lien, 2010].…”
Section: Scanning Electron Microscopy (Sem)supporting
confidence: 74%
“…1 ITO is a very important transparent conducting oxide (TCO) and has applications in variety of fields such as flat panel displays, light emitting diodes, solar cells and optical coatings [L. Kerkache et al, 2010;Minami et al, 2005;Venkat et al, 2006;T. K. Kim et al, 2009].…”
Indium thin oxide (ITO) films have been used in solar cell applications as top conducting layers for many years. These films possess very good transmission and a low sheet resistance thus making them ideal candidate material for top conducting layers in thin film and HIT solar cells. In the present work, ITO films have been deposited over soda lime glass substrates for use as defogger applications, and for use as front contact electrode in HIT type solar cells as well. ITO deposition is done using pulsed DC sputtering technique inside a vacuum chamber with large size ITO sputtering target of 15 inches by 5 inches. Silver bus bars are printed at the two edges of glass using thick film screen printing technique and the firing of thick film is done in a belt furnace. The deposited ITO thin film characterization is done by
using XRD, SEM and 4 probe sheet resistance measurement techniques. The transmission spectra is analyzed for optical transmission properties.
“…In addition to this, there should be a simple way to produce these plates quickly and inexpensively in bulk. State of the art at present is the usage of ITO coatings, which can be found as front contacts in thin film solar cells, touch screen applications or even organic LEDs [1][2][3] . ITO coatings show very good transmittances of ~80-91 % in the range of the visible spectrum (~400-800 nm) 4,5 and sheet resistance in the range of 6-103 Ω/ , depending on layer thickness and method of deposition 6,7 .…”
The demand of highly efficient transparent electrodes without the use of rare earth materials such as indium requires a new generation of thin metallic films with both high transparency and electrical conductivity. For this purpose, Direct Laser Interference Patterning was used to fabricate periodic hole-like surface patterns on thin metallic films in order to improve their optical transparency by selective laser ablation of the material and at the same time keeping the electrical properties at an acceptable level. Metallic films consisting of aluminum and copper with film thicknesses ranging between 5 and 40 nm were deposited on glass substrates and treated with nanosecond and picosecond pulse laser system. In order to analyze the processability of the films, the laser ablation threshold for each material as function of the layer thickness and pulse duration was firstly determined. After analyzing these initial experiments, the samples were structured with a 1.7 µm spatial period hole-like-pattern using three beam direct laser interference patterning. The structural quality of the fabricated structures was analyzed as function laser energy density (laser fluence) using scanning electron microscopy (SEM), atom force microscopy (AFM). Finally, optical and electrical properties of the films were characterized using optical spectroscopy, as well as surface impedance measurements.
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