2008 IEEE Computer Society Annual Symposium on VLSI 2008
DOI: 10.1109/isvlsi.2008.50
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Standard Cell Like Via-Configurable Logic Block for Structured ASICs

Abstract: A structured ASIC has some arrays of prefabricated yet configurable logic blocks (CLBs) with/without a regular routing fabric. In this paper, we propose a standard cell like via-configurable logic block (VCLB). We design a 0.18um standard cell library based on our VCLB and establish a design flow using as many commercial tools as possible. We also propose a method to evaluate the viability of a structured ASIC fabric. Our structured ASIC fabric with programmable metals for routing achieves a delay of 2.7 times… Show more

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Cited by 20 publications
(21 citation statements)
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“…Recently, Baek et al [43] proposed using selective pattern masks to customize CLBs into different logic functions. In the past, we proposed a VCLB whose layout design tailored to address some issues discussed in Section II-B [10]. This paper is partially based on this previous work.…”
Section: A Related Workmentioning
confidence: 99%
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“…Recently, Baek et al [43] proposed using selective pattern masks to customize CLBs into different logic functions. In the past, we proposed a VCLB whose layout design tailored to address some issues discussed in Section II-B [10]. This paper is partially based on this previous work.…”
Section: A Related Workmentioning
confidence: 99%
“…Unified Sequential and Combinational VCLB: This is about the capability of configuring the same transistors into combinational logic functions or a flip-flop [7], [10], [36], [45]. Such a capability enables us to save chip area.…”
Section: B Basic Design Issues About Vclbsmentioning
confidence: 99%
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“…In VCLB approach, distances are not exact multiples, as can be seen in Fig. 1(c) [12]. Thus, adjusting lines to a common pitch may imply significant area penalty.…”
Section: B Neighbouringmentioning
confidence: 99%
“…Metal1 and polysilicon masks based on (a) VCTA [10], (b) VCC (up) and INVA (down)[11], (c) VCLB[12]. Comparison between drawn layout (a) and lithography simulation (b) of pattern samples.…”
mentioning
confidence: 99%