“…Moreover, if an atomic-layer-by-layer 1 (ALL-MBE) synthesis mode is achieved, one can terminate the film growth at a desired atomic layer, as well as study the effects of epitaxial strain, proximity effects in heterostructures, etc. But this comes at the expense of substantial technical sophistication and challenges, and hence just a few systems in which complex-oxide MBE synthesis is integrated under ultra-high vacuum (UHV) conditions with ARPES 2,3,4,5,6,7,8 and/or STM 9 , have been built and operated so far.…”