Abstract:Chromium oxycarbide (Cr2CO) films were deposited on stainless steel and copper plates via plasma‐assisted chemical vapor deposition. The films were heated to 1073 K under high‐vacuum conditions, to examine the high‐temperature stability of the films. X‐ray diffractometry revealed that the films decomposed to a mixed structure of Cr2O3 and Cr3C2. Thermogravimetric analysis and differential thermal analysis revealed that the decomposition occurred in the temperature range of 858‐910 K.
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