Structural and Electrical Studies of Boric Acid Doped Cadmium Oxide Thin Film by JNSP Technique for Optoelectronic Applications

Abstract

The present work deals with preparation and characterization of boric acid (b) dopped cdo thin films by the jet nebulizer spray pyrolysis technique at optimized temperature 450°C. Boric acid doped cdo thin films were prepared by jet nebulizer spray pyrolysis technique with different wt% of boric acid (x=0, 0.5,2.5, 4). The xrd pattern of various weight percentage boric acid dopped cdo thin films show the polycrystalline nature with cubic structure. At room temperature, the electrical conductivity of the prepared films increases with 4Wt% of 2.32x10-3 S/cm. The plot of voltage versus current as a function of temperature (RT-30°C) indicates the ohmic behavior of the films. Moreover, significant optoelectronic applications are cadmium oxide dopped with boric acid thin films at room temperature electrical resistivity is in the order of 101Ω cm which is low enough to be a good supercapacitor electrode material.