2004
DOI: 10.1016/j.jnoncrysol.2004.08.001
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Structural and optical characterization of amorphous As40S60 and As40Se60 films prepared by plasma-enhanced chemical vapor deposition

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Cited by 23 publications
(12 citation statements)
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“…Values of T Mo and T mo are listed in Table 1. Knowing the values of the two envelopes T Mo and T mo helped us to apply Swanepoel method [19][20][21][22][23][24][25][26][27][28] in order to complete to drive all the optical constants as well detailed in the pervious section. The average value of film-thickness d for Ge 10 Se 90Àx Te x films are listed in Table 1 (Fig.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Values of T Mo and T mo are listed in Table 1. Knowing the values of the two envelopes T Mo and T mo helped us to apply Swanepoel method [19][20][21][22][23][24][25][26][27][28] in order to complete to drive all the optical constants as well detailed in the pervious section. The average value of film-thickness d for Ge 10 Se 90Àx Te x films are listed in Table 1 (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…(7). Where, the values of T Mo and T mo are known, one can optically characterize the non-uniform chalcogenide films by the applying the procedure corresponding to uniform film [19][20][21][22][23][24][25][26][27][28].…”
Section: Theoretical Considerationsmentioning
confidence: 99%
“…The envelope technique enabled the determination of the average thickness and the refractive index of the Ch-Gs films with accuracy better than 1% [20]. In view of Ref.…”
Section: Determination Of the Film Thicknessmentioning
confidence: 99%
“…It has been found that selenium based alloy are useful due to their greater hardness, high photosensitivity, higher crystallization temperature and small ageing effect as compare to pure Se. Different techniques are used for the preparation of thin films such as thermal evaporation technique [13] chemical bath deposition [14] chemical vapor deposition [15] rf/dc sputtering [16]. The properties mostly depend on the preparation and deposition technique.…”
Section: Introductionmentioning
confidence: 99%