2002
DOI: 10.1016/s0304-8853(01)00866-6
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Structural, magnetic and magnetotransport properties of thin films of the Heusler alloys Cu2MnAl, Co2MnSi, Co2MnGe and Co2MnSn

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Cited by 132 publications
(66 citation statements)
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“…The CMS thin films (20,50, and 100 nm in thickness) were deposited on a-plane sapphire substrates by UHVmagnetron rf-sputtering using pure Ar at a pressure of 5 Â 10 À3 mbar as sputter gas. The growth conditions (growth rate, Ar pressure, and substrate temperature) were preliminarily tested in order to optimize the structural quality of the films [20].…”
Section: Sample Preparation and Structural Propertiesmentioning
confidence: 99%
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“…The CMS thin films (20,50, and 100 nm in thickness) were deposited on a-plane sapphire substrates by UHVmagnetron rf-sputtering using pure Ar at a pressure of 5 Â 10 À3 mbar as sputter gas. The growth conditions (growth rate, Ar pressure, and substrate temperature) were preliminarily tested in order to optimize the structural quality of the films [20].…”
Section: Sample Preparation and Structural Propertiesmentioning
confidence: 99%
“…The growth conditions (growth rate, Ar pressure, and substrate temperature) were preliminarily tested in order to optimize the structural quality of the films [20]. The found best parameters are: base pressure of 2 Â 10 À9 mbar in the sputtering system, sputtering rate of 0.03 nm/s for CMS and of 0.025 nm/s for the previously deposited vanadium seed underlayer.…”
Section: Sample Preparation and Structural Propertiesmentioning
confidence: 99%
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“…Cobalt-based full-Heusler alloys have been considered potential candidates for showing HMF properties. Their structural and magnetic properties have been intensively investigated experimentally [4][5][6][7][8][9][10][11][12][13][14][15][16][17][18] and theoretically [19][20][21][22][23] because they have comparatively high Curie temperatures T C . In particular, Co 2 Cr 1−x Fe x Al (CCFA) is expected to have suitable electro-magnetic properties for injecting a spinpolarized current [16,22].…”
Section: Introductionmentioning
confidence: 99%
“…4. Some of the experimental measurements of the electrical resistivity of Co-based Heusler alloys are reported by several workers, 7 µΩcm [15] for the single crystal, 106 µΩcm [16] for the thin film of Co 2 MnSi, and 0.2 µΩcm [17] for the single crystal, 41 µΩcm [18] for the thin film of Co 2 FeSi, respectively. These data seem to be good agreement with the calculated results, although there is no guarantee that the degree of the order, i.e.…”
Section: Resultsmentioning
confidence: 97%