“…Various techniques have been used for the preparation of ZnMgO films such as radio-frequency plasma-assisted molecu-lar beam epitaxy (RF-MBE) [2,7,10,11], DC [12,13] and RF [1,3,6] magnetron sputtering, pulsed laser deposition (PLD) [14,15], plasma-enhanced atomic layer deposition (PE-ALD) [16], chemical vapor deposition (CVD) [17], metal-organic chemical vapor deposition (MOCVD) [18,19], hydrothermal [4], chemical bath deposition (CBD) [20], sol-gel spin coating [21][22][23][24][25][26][27][28][29], and spray pyrolysis [28][29][30][31][32][33][34]. Among these techniques, the sol-gel spin coating method has the advantage of ensuring easy control and handling of chemicals and substrates, as well as excellent control over stoichiometry.…”