Abstract:Purpose
This study aims to carry out the deposition of zinc sulfide (ZnS) thick films on glass and silicon (100) substrates using radio frequency (RF) magnetron sputtering method at different powers. Film structure has been analyzed by X-ray diffraction (XRD); the patterns showed that the films possesses a cubic structure with (111) preferred orientation. Photoluminance (PL) intensity of the films has been related to the crystallinity, which is varied with the power.
Design/methodology/approach
Scanning elec… Show more
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