Structures, morphologies, and chemical states of sputter-deposited CrZrN thin films with various Zr contents

Chantharangsi, Chirawat; Denchitcharoen, Somyod; Chaiyakun, Surasing; Limsuwan, Pichet

doi:10.1016/j.tsf.2015.06.045

Cited by 12 publications

(4 citation statements)

References 32 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…TiZrN ternary system presented higher hardness, corrosion resistance and lower friction coefficient when compared to the binary nitride. Other reports also demonstrate that Zr addition resulted in increments to mechanical properties when compared to pure binary nitrides de TiN e CrN [22][23][24].…”

Section: Introductionmentioning

confidence: 90%

Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

et al. 2021

View full text Add to dashboard Cite

Ta 1-x Zr x N thin films were deposited by reactive magnetron sputtering aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. GAXRD showed that all Ta 1-x Zr x N thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta 1-x Zr x N coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin films.

show abstract

Section: Introductionmentioning

confidence: 90%

Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

et al. 2021

View full text Add to dashboard Cite

show abstract

“…Multilayer AlN/Ag/AlN films were deposited on 10 cm x 10 cm Si(100) wafers and microscope glass slides using a home-built closed field unbalanced DC magnetron co-sputtering system. The schematic diagram of the magnetron co-sputtering system has been previously described elsewhere (Chantharangsi et al, 2015).…”

Section: Methodsmentioning

confidence: 99%

Preparation and Characterization of Low- emissivity AlN/Ag/AlN Films by Magnetron Cosputtering Method

Phae-ngam,

Kamoldilok,

Rattana

et al. 2023

JCST

View full text Add to dashboard Cite

AlN and Ag thin films were deposited independently on the Si(100) wafers and glass slides by sputtering techniqueat various times to find the optimum deposition times for coating AlN and Ag films layers. The results obtained fromglazing-incident X-ray diffraction (GIXRD), field-emission scanning electron microscopy (FE-SEM), and transmittancemeasurements showed that the optimum deposition time for coating AlN and Ag film layers were 40 min and 15 scorresponding to the film thickness of 46.7 and 19.6 nm, respectively. The optimum deposition times were used forcoating AlN and Ag films in the multilayer AlN/Ag/AlN film stack. Then, the multilayer AlN/Ag/AlN film stack wasdeposited on the glass slide for transmittance measurement and a test glass plate with a size of 10 cm x 10 cm for infraredprotection testing. The average solar transmittances in the visible range ( = 380-780 nm) and in the near infrared range( = 780-2,000 nm) were found to be 48.05 and 15.17%, respectively which are comparable with those of a commercialglass.

show abstract

“…Titanium‐based nitride coatings have excellent mechanical and thermal properties, which have made them widely used to improve the lifetime and the performance of cutting tools . However, titanium‐based nitride has relatively lower mechanical properties than cBN and diamond‐like carbon (DLC) coatings.…”

Section: Introductionmentioning

confidence: 99%

“…Titanium-based nitride coatings have excellent mechanical and thermal properties, which have made them widely used to improve the lifetime and the performance of cutting tools. [1][2][3][4][5] However, titanium-based nitride has relatively lower mechanical properties than cBN and diamond-like carbon (DLC) coatings. To overcome this limitation, researches about improving the mechanical properties trough the change of the coating composition or residual stress control have been conducted recently.…”

Section: Introductionmentioning

confidence: 99%

Lattice distortion and residual stress of a carbon‐doped TiZrN coating

Hong

Jeon

Choi

et al. 2018

Int J Applied Ceramic Tech

View full text Add to dashboard Cite

The mechanism of hardness improvement of a TiZrN coating by carbon doping was investigated in terms of the residual stress and the lattice deformation. Carbon was doped using laser carburization to improve the hardness of TiZrN, which was increased from 3025 HV to 3388 HV. The lattice parameter was calculated through Rietveld refinement in order to analyze the behavior inside the lattice due to carbon doping, which showed that the parameter increased from 4.21 Å to 4.44 Å after the carbon doping process. The diffraction pattern was analyzed using an electron beam to identify the lattice state of the coating layer, and lattice distortion was revealed through a diffused ring pattern. The compressive residual stress was increased by 48%, which was identified through the sin2Ψ method using the lattice constant change due to carburization. After the carbon doping, the hardness of the TiZrN was increased by 10%, which was attributed to the expansion distortion generated in the TiZrN lattice and the increase of the compressive residual stress.

show abstract

Structures, morphologies, and chemical states of sputter-deposited CrZrN thin films with various Zr contents

Cited by 12 publications

References 32 publications

Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

Preparation and Characterization of Low- emissivity AlN/Ag/AlN Films by Magnetron Cosputtering Method

Lattice distortion and residual stress of a carbon‐doped TiZrN coating

Contact Info

Product

Resources

About