1997
DOI: 10.1007/s002160050150
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Studies on a new cleaning procedure for PFA-surfaces

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Cited by 7 publications
(4 citation statements)
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“…1. Starting from sample preparation in clean boxes or clean rooms the samples to be analysed have to be handled in PFA (perfluoroalkoxy) and quartz vessels before and in synthetic quartz vessels during irradiation to reduce the blank value of the analysis [1]. The irradiation parameters of sample mass and neutron flux should be as large as possible while the irradiation time can be adapted to the matrix and to the trace elements to be determined.…”
Section: Increasing the Sensitivity Of Naamentioning
confidence: 99%
See 1 more Smart Citation
“…1. Starting from sample preparation in clean boxes or clean rooms the samples to be analysed have to be handled in PFA (perfluoroalkoxy) and quartz vessels before and in synthetic quartz vessels during irradiation to reduce the blank value of the analysis [1]. The irradiation parameters of sample mass and neutron flux should be as large as possible while the irradiation time can be adapted to the matrix and to the trace elements to be determined.…”
Section: Increasing the Sensitivity Of Naamentioning
confidence: 99%
“…These detectors are designed to measure rare interactions of particles at the lowest possible background being shielded from cosmic and natural radioactivity since this activity can mimic the type of interaction one is interested in [1].…”
Section: Introductionmentioning
confidence: 99%
“…The sensitivity of NAA is not only limited by the matrix but it is also determined by the activation parameters. The samples have to be prepared in clean boxes or clean rooms and handled in PFA (perfluoroalkoxy polymeric materials) and quartz vessels before the irradiation and in synthetic quartz vessels during the irradiation, in order to reduce the blank value of the analysis [19]. The irradiation parameters of sample mass and neutron flux should be as large as possible while the irradiation time can be adjusted to the matrix and the trace elements to be determined.…”
Section: Increasing the Sensitivity Of Naamentioning
confidence: 99%
“…At present, wet processes in semiconductor manufacturing require high purity standards and improved materials for fluid system components 1–3 . High‐purity chemicals used in the manufacturing of semiconductors, such as hydrofluoric acid, nitric acid, and potassium hydroxide, are transported through valves, fittings, and containers 4 .…”
Section: Introductionmentioning
confidence: 99%