Studies on Ion Emission from the Plasma Focus Device by Using Ion Collector and Track Detector

Bhuyan, M.; Neog, N. K.; Mohanty, S. R.; Rao, C. V. S.; Raole, P.M.

doi:10.1007/s10894-009-9254-6

Cited by 8 publications

(1 citation statement)

References 24 publications

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“…The emission of the polyenergetic ions is a general characteristic of the PF device. [35][36][37] However, the lowest and the highest energy ions may differ from the experiment to experiment and the detection methodology. Bostick et al observed the deuteron energy spectrum ranging from 300 keV to 9 MeV, 38 whereas Gardin et al measured the deuteron energy down to around 25 keV.…”

Section: -3mentioning

confidence: 99%

Temporal and spatial study of neon ion emission from a plasma focus device

Bhuyan¹,

Neog²,

Mohanty³

et al. 2011

Physics of Plasmas

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The temporal and spatial characteristics of the neon ion beam emissions from a low energy plasma focus device have been studied by employing a multiple Faraday cup assembly and the CR-39 track detectors at different angular and axial positions. In addition, the operating gas pressures were also varied to study the temporal and spatial characteristics of the neon ion beam emissions. The Faraday cup analyses show that the ion flux strongly depends on the operating gas pressure as well as the angular positions. The estimated ion energy measurements at the aperture of the Faraday cup indicate that the plasma focus device is a source of polyenergetic ions ranging from approximately a few keV to a few hundreds of keV, irrespective of the angular positions. The exposed CR-39 detectors have shown the formation of multiple ion tracks with diameter ranging from 2 to 13 m. The populations of lower diameter tracks ͑2-6 m͒ are observed to be more at 0°and 10°angles. It is also noticed that the most populated track counts have shifted toward the higher diameter as the angular positions change from 0°to 70°. The present study enables us to predict a clear picture of ion flux and energy distribution inside the plasma focus chamber that will help to use the device for material irradiation application in a more controlled manner.

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